Electron beam lithography system
Original notice title
Netherlands – Laboratory, optical and precision equipments (excl. glasses) – European Tender Electron Beam Lithography system
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Buyer
Location
Enschede, NLD
Website
Buyer profile
Identifier
50130536
Activity
Education
Lots (1)
LOT-0000
European Tender Electron Beam Lithography system
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
EUR 3.5M
Estimated value
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Category
Award details
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
Additional CPV codes
Procurement Details
- Publication date
- 08 Jul 2026
- Languages
- English
Reference metadata
- Legal basis
- 32014L0024
Reference IDs
- Tender ID
- 474919-2026
Documents (1)
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Opportunity Score
Why this score?
Opportunity
0 / 100
Complexity
0 / 100
Risk factors
Submission deadline in 3 days
Deep Portfolio Analysis
Uses:
- Description
- Industries & Services
- Capabilities
- Market & Experience
- Certifications